Hybrid FIB milling strategy for the fabrication of plasmonic nanostructures on semiconductor substrates

نویسندگان

  • Joshua F Einsle
  • Jean-Sebastien Bouillard
  • Wayne Dickson
  • Anatoly V Zayats
چکیده

The optical properties of plasmonic semiconductor devices fabricated by focused ion beam (FIB) milling deteriorate because of the amorphisation of the semiconductor substrate. This study explores the effects of combining traditional 30 kV FIB milling with 5 kV FIB patterning to minimise the semiconductor damage and at the same time maintain high spatial resolution. The use of reduced acceleration voltages is shown to reduce the damage from higher energy ions on the example of fabrication of plasmonic crystals on semiconductor substrates leading to 7-fold increase in transmission. This effect is important for focused-ion beam fabrication of plasmonic structures integrated with photodetectors, light-emitting diodes and semiconductor lasers.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Ion-beam assisted laser fabrication of sensing plasmonic nanostructures

Simple high-performance, two-stage hybrid technique was developed for fabrication of different plasmonic nanostructures, including nanorods, nanorings, as well as more complex structures on glass substrates. In this technique, a thin noble-metal film on a dielectric substrate is irradiated by a single tightly focused nanosecond laser pulse and then the modified region is slowly polished by an a...

متن کامل

Large-area Low-cost Fabrication of Complex Plasmonic Nanostructures for Sensing Applications

In this thesis, we introduce hole-mask colloidal lithography and nanosphere lithography techniques for low-cost nanofabrication of large-area (about 1 cm) plasmonic nanostructures with different complex shapes. For the first one, we use thin film PMMA-gold hole-masks, which are first prepared with polystyrene colloids, combined with following tilted-angle-rotation evaporation to fabricate large...

متن کامل

Silicon Nanostructure Fabrication by Direct FIB Writing and TMAH Wet Chemical Etching

The development of nanoscale devices requires rapid prototyping methods that can be applied in combination with well-known clean room processing techniques. We show that focused ion beam (FIB) Ga-ion implantation can be used for creating masks for the fabrication of silicon nanostructures by IC-compatible, anisotropic tetramethylammonium hydroxide (TMAH) wet etching. The FIB writing modifies on...

متن کامل

Focused ion beam nano-structuring of photonic Bragg gratings in Al2O3 waveguides

Focused ion beam (FIB) etching is receiving increasing attention for the fabrication of active integrated optical components such as waveguide amplifiers and lasers. Si-technology compatible low-loss Al2O3 channel waveguides grown on thermally oxidized silicon substrates have been reported recently. We used FIB milling for reflection grating definition on Al2O3 channel and ridge waveguides. Str...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره 6  شماره 

صفحات  -

تاریخ انتشار 2011